Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.12104/43412
Title: Influence of plasma density on the chemical composition and structural properties of pulsed laser deposited TiAlN thin films
Author: Rigas, I.
Sanchez-Soto, L.L.
Klimov, Andrei B.
Rehacek, J.
Hradil, Z.
Issue Date: 2011
Abstract: A comprehensive theory of the Weyl-Wigner formalism for the canonical pair angle-angular momentum is presented. Special attention is paid to the problems linked to rotational periodicity and angular-momentum discreteness. " 2010 Elsevier Inc.",,,,,,"10.1016/j.aop.2010.11.016",,,"http://hdl.handle.net/20.500.12104/43412","http://www.scopus.com/inward/record.url?eid=2-s2.0-79151472018&partnerID=40&md5=ef80bb7ac9ea0e3d005fec7d8713fdf4",,,,,,"2",,"Annals of Physics",,"426
439",,"326",,"Scopus
WOS",,,,,,"Angular momentum; Angular variables; Phase-space methods; Tomography",,,,,,"Orbital angular momentum in phase space",,"Article" "44013","123456789/35008",,"Quiñones-Galván, J.G., Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apartado Postal 18-1027, México D.F. C.P. 11801, Mexico; Camps, E., Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apartado Postal 18-1027, México D.F. C.P. 11801, Mexico; Muhl, S., Instituto de Investigaciones en Materiales, UNAM, México D.F. C.P. 04510, Mexico; Flores, M., Departamento de Ingeniería de Proyectos, CUCEI, Universidad de Guadalajara, Apdo. Postal 307, C.P. 45101 Zapopan, Jalisco, Mexico; Campos-González, E., Departamento de Física, CINVESTAV-IPN, Apdo. Postal 14-740, México D.F. 07360, Mexico",,"Quinones-Galvan, J.G.
Camps, E.
Muhl, S.
Flores, M.
Campos-Gonzalez, E.",,"2014",,"Incorporation of substitutional Al into the TiN lattice of the ternary alloy TiAlN results in a material with improved properties compared to TiN. In this work, TiAlN thin films were grown by the simultaneous ablation of Ti and Al targets in a nitrogen containing reactive atmosphere. The deposit was formed on silicon substrates at low deposition temperature (200 °C). The dependence of the Al content of the films was studied as a function of the ion density of the plasma produced by the laser ablation of the Al target. The plasma parameters were measured by means of a planar Langmuir probe and optical emission spectroscopy. The chemical composition of the films was measured by energy dispersive X-ray spectroscopy. The results showed a strong dependence of the amount of aluminum incorporated in the films with the plasma density. The structural characterization of the deposits was carried out by Raman spectroscopy, X-ray diffraction, and transmission electron microscopy, where the substitutional incorporation of the Al into the TiN was demonstrated. " 2014 AIP Publishing LLC.
URI: http://hdl.handle.net/20.500.12104/42234
http://www.scopus.com/inward/record.url?eid=2-s2.0-84901376778&partnerID=40&md5=a7e69735011a52ca4d14075f6c0a1be8
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